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Phosphoric Acid (H₃PO₄) - Used for etching silicon nitride: The 165°C Chemical Infrastructure Quietly Holding Together AI Chips, Memory Stacks, and Yield Discipline
  A semiconductor fab looks like a city where nothing is allowed to be dirty, late, hot in the wrong place, or chemically uncertain. Inside that city, Phosphoric Acid (H₃PO₄) - Used for etching silicon nitride works like a disciplined demolition crew. It removes silicon nitride without destroying the oxide, silicon, or device geometry beneath it. That sounds small until one 300 mm wafer is...
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